- TESCAN MIRA3 LHM
- Landing energy: 200 eV – 30 keV (down to 50 eV with BDT)
- Probe current: 6 pA – 150 nA
- Schottky field electron emitter
- Resolution: 1.5 nm @ 15 keV, 4.5 nm @ 1 keV, 0.8 nm @ 30 keV (STEM)
- Beam deceleration option to enhance low keV performance
- Motorized, 5-axis goniometer stage (XY 80 x 60 mm)
- Multi-ported large (Ø 230 mm) specimen chamber
- Scanning transmission electron imaging (STEM)
- EDS elemental analysis, imaging and mapping
- High and Low vacuum mode
- Detectors:
- Secondary electrons: in-chamber, in-beam
- Back-scattered electrons: in-chamber, in-beam LE-BSE
- Transmitted electrons: STEM BF / DF / HAADF
- EDS: Oxford Ultim Max + Ultim Extreme
- Sputter coater available for depositing thin metal films (Au, Ag, Pt) for imaging of insulating materials
Prof. Dr. Alexander Bulgakov
Senior Researcher: Nanomaterials; alexander.bulgakov(at)hilase.cz; + 420 314 007 733
